Microlithography data analysis package capable of fitting Bossung type data sets, also known as focus exposure matrices. Keywords: Lithography, Photolithography, Photoresist, Process Window, Critical Dimension, CD, Bossung, FEM
VERSION HISTORY
- Version N/A posted on 2011-08-11
Several fixes and updates - Version N/A posted on 2011-08-11
Program Details
- Category: Development > Other
- Publisher: freedata.sf.net
- License: Free
- Price: N/A
- Version: Array
- Platform: windows