FreeDATA

License: Free ‎File size: N/A
‎Users Rating: 5.0/5 - ‎1 ‎votes

Microlithography data analysis package capable of fitting Bossung type data sets, also known as focus exposure matrices. Keywords: Lithography, Photolithography, Photoresist, Process Window, Critical Dimension, CD, Bossung, FEM

VERSION HISTORY

  • Version N/A posted on 2011-08-11
    Several fixes and updates
  • Version N/A posted on 2011-08-11

Program Details